Photosensitive resin composition and color filter
US7858275B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 10, 2006 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Nov 21, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive photosensitive resin composition with favorable heat resistance and transparency is provided. The photosensitive resin composition contains a resin component (A1) having a structural unit (a1′) obtained by substituting at least a portion of hydrogen atoms of phenolic hydroxyl groups within a structural unit represented by a general formula (a1) shown below with a naphthoquinone-1,2-diazide-5-(and/or -4-) sulfonyl group.(In the above general formula, R0 represents a hydrogen atom or methyl group, R1 represents a single bond or an alkylene group of 1 to 5 carbon atoms, R2 represents an alkyl group of 1 to 5 carbon atoms, a represents an integer from 1 to 5, b represents either 0 or an integer from 1 to 4, and a+b is no greater than 5. If two or more R2 groups exist, then these R2 groups may be either the same or mutually different.)
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.