Patent · US Active

Imageable elements with components having 1H-tetrazole groups

US7858292B2 · kind B2 · utility

3Cited by

3References

24Claims

0Family size

Assignee

EASTMAN KODAK COMPANY · US

Inventors

Harald Baumann · Tuttlingen, DE
Udo Dwars · Herzberg, DE
Bernd Strehmel · Berlin, DE
Christopher D. Simpson · Osterode, DE
Celin Savariar-Hauck · Badenhausen, DE
Gerhard Hauck · Badenhausen, DE

Key dates

Filing date	Dec 4, 2007
Grant date	Dec 28, 2010
Priority date	—
Expiry date	Feb 18, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/121
WIPO fieldTextile and paper machines
WIPO sectorMechanical engineering

Abstract

Radiation-sensitive compositions and imageable elements include a polymeric or non-polymeric component in an imageable layer, which component includes 1H-tetrazole groups. The non-polymeric components can be radically polymerizable compounds. The polymeric components can have 1H-tetrazole groups that are pendant to the backbone. The use of such components in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates that show improved chemical resistance and run length.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.