Manufacturing method of array substrate for liquid crystal display device with color filter layer on thin film transistor
US7858452B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 14, 2009 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Sep 14, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136227
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing a liquid crystal display device includes forming a gate line and a gate electrode on a substrate, forming a gate insulating layer on substantially an entire surface of the substrate, forming an active layer, an ohmic contact layer, a source electrode, a drain electrode and a data line on the gate insulating layer, forming a black matrix on the first passivation layer, forming a color filter layer on the first passivation layer in the pixel region, forming a second passivation layer on substantially an entire surface of the substrate, forming a photoresist pattern to expose the second passivation layer, removing the exposed second passivation and removing a portion of the first passivation layer contacting the second passivation layer, forming a transparent conductive layer on substantially an entire surface of the substrate, and forming a pixel electrode in the pixel region by removing the photoresist pattern and the transparent conductive layer on the photoresist pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.