Patent · US Active

Electrode arrangement

US7859180B2 · kind B2 · utility

1Cited by

3References

14Claims

0Family size

Assignee

Softal Electronic Erik Blumenfeld GmbH & Co. · DE

Inventors

Eckhard Prinz · Schwarzenbek, DE
Peter Palm · Gerolsheim, DE
Frank Forster · Oberkirch, DE

Key dates

Filing date	Jun 1, 2007
Grant date	Dec 28, 2010
Priority date	—
Expiry date	Jan 11, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01T19/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Disclosure of an electrode arrangement (1) as high voltage electrode for continual plasma treatment or plasma coating of web material with several knife electrodes (3) arranged at a right angle to any transport direction of the web material and essentially located parallely to each other which is characterized by the fact that the distances (a−e) of adjacent knife electrodes (3) vary. In tests it has turned out that a more uniform coating result or, respectively, treatment result can be achieved with such an electrode arrangement than with comparable arrangements in which the knife electrodes are arranged equidistant. Preferably, the distances (a) between adjacent knife electrodes (3) are larger at the edges of the electrode arrangement (1) than the distances (e) between adjacent knife electrodes (3) in its center.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.