One row wavelet sensor layout for resistivity imaging
US7859265B2 · kind B2 · utility
1Cited by
9References
5Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 27, 2007 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Oct 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V3/20
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor electrode for imaging a formation. The sensor includes a geometry either reduces or substantially limits spatial aliasing in formation data. The aliasing is the result of imaging the formation with an array of the sensor electrodes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.