Methods and apparatuses for image exposure correction
US7859573B2 · kind B2 · utility
2Cited by
3References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 31, 2007 |
| Grant date | Dec 28, 2010 |
| Priority date | — |
| Expiry date | Aug 28, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N23/74
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Methods and apparatuses for image exposure include capturing a first image under a first illumination condition, determining a luminance of the first image at a plurality of sectors, capturing a second image under a second illumination condition employing an artificial light source, determining a luminance of the second image at the plurality of sectors, and determining if the artificial light source should be used to capture a final image using the luminances of the first and second images at the plurality of sectors. If the artificial light source is to be used, an output level of the light source is determined.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.