Plasma torch for making synthetic silica
US7861557B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2006 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Nov 3, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P40/57
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The improved plasma torch for making synthetic silica includes use of nitrogen screen gas from outer quartz tubing to provide active environment isolation. In addition, the present induction plasma torch includes a ring disk for more compact but complete environmental protection (360 degree coverage). It also includes offsetting and switching the position of the chemical injection nozzles for allowing improved deposition in both directions, when operated in a horizontal mode. Further, the present induction plasma torch maintains laminar flow for the injected chemicals and the middle quartz tube is provided with a concave section for increasing the average enthalpy of plasma jet, thus improving the efficiency of the plasma torch. In addition, it may utilize more plasma gas inlets. It also includes chemical injection nozzles having a downward angular inclination.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.