Patent · US Active

Method of correcting for pattern run out

US7862859B2 · kind B2 · utility

0Cited by
4References
15Claims
0Family size

Assignee

Inventor

Key dates

Filing dateJun 1, 2007
Grant dateJan 4, 2011
Priority date—
Expiry dateNov 3, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/975
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A method of correcting for pattern run out in a desired pattern in directional deposition or etching comprising the steps of

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.