Patent · US Active

Process for preparing stable photoresist compositions

US7862983B2 · kind B2 · utility

1Cited by
3References
2Claims
0Family size

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Inventors

Key dates

Filing dateMay 6, 2010
Grant dateJan 4, 2011
Priority date—
Expiry dateMay 6, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0392
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A composition of matter consisting of a stable solution containing a polymer derived from a solution of a polymer containing trace metals, the derived method comprising the steps of:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.