Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
US7862990B2 · kind B2 · utility
11Cited by
0References
15Claims
0Family size
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Key dates
| Filing date | Dec 31, 2007 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Jul 27, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/952
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.