Wavefront analysis method involving multilateral interferometry with frequency difference
US7864340B2 · kind B2 · utility
2Cited by
14References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 7, 2008 |
| Grant date | Jan 4, 2011 |
| Priority date | — |
| Expiry date | Sep 15, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01J2009/0226
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The method comprises positioning a diffraction grating with a two-dimensional meshing on the path of the beam to be analyzed and processing at least two interferograms of at least two different colors, each interferogram being obtained in a plane from two sub-beams with different diffraction orders. The invention can be used to analyze and correct divided wavefronts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.