Photoresist coating liquid supplying apparatus, and photoresist coating liquid supplying method and photoresist coating apparatus using such photoresist coating liquid supplying apparatus
US7867559B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 25, 2005 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | May 16, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05C11/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner.The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus. The photoresist coating apparatus comprises a combination of the coating liquid supplying apparatus with a slit coating apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.