Process for the modification of substrate surfaces through the deposition of amorphous silicon layers followed by surface functionalization with organic molecules and functionalized structures
US7867627B2 · kind B2 · utility
19Cited by
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8Claims
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Key dates
| Filing date | Dec 13, 2005 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | Aug 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31667
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Functionalized substrates and method of passivating the surface of a substrate to improve the surface by imparting desirable surface properties to improve the performance of a surface, the method steps including exposing the substrate to a chemical vapor deposition process to coat the substrate with silicon, and functionalizing the coated surface by exposing the substrate surface to a binding reagent having at least one unsaturated hydrocarbon group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.