Method for manufacturing a microstructure, exposure device, and electronic apparatus
US7867692B2 · kind B2 · utility
6Cited by
11References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 16, 2005 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | Jun 21, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/02133
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Aspects of the invention can provide a method for manufacturing a microstructure, including forming a photosensitive film above a work piece, exposing the photosensitive film, as a first exposure, by irradiating interference light generated by intersecting two laser beams having a wavelength shorter than a wavelength of visible light, developing the exposed photosensitive film so as to develop a shape corresponding to a pattern of the interference light to the photosensitive film, and etching the work piece using the developed photosensitive film as an etching mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.