Methods for mastering microstructures through a substrate using negative photoresist
US7867695B2 · kind B2 · utility
20Cited by
21References
16Claims
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Key dates
| Filing date | Sep 11, 2003 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | Feb 3, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Microstructures are fabricated by impinging a radiation beam, such as a laser beam, through a substrate that is transparent to the laser beam, into a negative photoresist layer on the substrate. The negative photoresist layer may be subsequently developed to provide a master for optical and/or mechanical microstructures. Related systems, microstructure products and microstructure masters also are disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.