Method for manufacturing pattern formed structure
US7867925B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 6, 2005 |
| Grant date | Jan 11, 2011 |
| Priority date | — |
| Expiry date | Apr 6, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The main object of the present invention is to provide a method for manufacturing efficiently a pattern formed structure which has a surface having a property-varied pattern and can be used to manufacture a color filter or the like. In order to achieve the object, the present invention provides a method for manufacturing a pattern formed structure, comprising: a patterning substrate preparing process of preparing a patterning substrate having a base material and a property variable layer which is formed on the base material and has a property variable by action of a photocatalyst based on irradiation with energy; and an energy radiating process of arranging a photocatalyst containing layer side substrate having a base body and a photocatalyst containing layer comprising at least the photocatalyst, and the patterning substrate so as to keep a given interval between the photocatalyst containing layer and the property variable layer, and then radiating energy onto the resultant at an intensity of 0.1 to 10 mW/cm2, thereby forming a property variable pattern in which the property of the property variable layer is varied.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.