Patent · US Active

Surface-distortion measuring device and method

US7869061B2 · kind B2 · utility

10Cited by
3References
18Claims
0Family size

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Key dates

Filing dateSep 14, 2006
Grant dateJan 11, 2011
Priority date
Expiry dateNov 26, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T7/521
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A surface-distortion measuring device and a surface-distortion measuring method can quantitatively, rapidly, and highly accurately measure and evaluate surface-distortion distribution at all of observable points on a specular or semi-specular surface of a measurement target. The device includes pattern displaying means 2 capable of switching and displaying a plurality of kinds of light-and-shade patterns 5, capturing means 3 for capturing mirror images, reflected in the specular or semi-specular surface of a measurement target 1, of the plurality of light-and-shade patterns displayed on the pattern displaying means, and surface-distortion distribution calculating means 10 for performing image processing on the captured mirror images of the plurality of light-and-shade patterns to calculate surface-distortion distribution of the measurement-target surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.