Continuous ARC deposition apparatus and method with multiple available targets
US7871506B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 23, 2005 |
| Grant date | Jan 18, 2011 |
| Priority date | — |
| Expiry date | Nov 13, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3417
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionable in a standby position. An electrical power supply is provided for supplying electrical power to the target held in the operative position to form an arc on an emission surface of the operative target. Means are provided for preparing an emission surface of the target positioned in the standby position to have a predetermined morphology. Alternatively, or in conjunction with the surface preparing means, means are provided for inspecting whether the emission surface of the target positioned in the standby position has a predetermined morphology. Preferably, the positioning means is configured to interchange the at least two targets at a predetermined time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.