Method and apparatus for scatterfield microscopical measurement
US7872741B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2008 |
| Grant date | Jan 18, 2011 |
| Priority date | — |
| Expiry date | Apr 21, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/06
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and an apparatus are disclosed for scatterfield microscopical measurement. The method integrates a scatterometer and a bright-field microscope for enabling the measurement precision to be better than the optical diffraction limit. With the aforesaid method and apparatus, a detection beam is generated by performing a process on a uniform light using an LCoS (liquid crystal on silicon) or a DMD (digital micro-mirror device) which is to directed to image on the back focal plane of an object to be measured, and then scattered beams resulting from the detection beam on the object's surface are focused on a plane to form an optical signal which is to be detected by an array-type detection device. The detection beam can be oriented by the modulation device to illuminate on the object at a number of different angles, by which zero order or higher order diffraction intensities at different positions of the plane at different incident angles can be collected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.