Plasma generating equipment
US7875825B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 25, 2005 |
| Grant date | Jan 25, 2011 |
| Priority date | — |
| Expiry date | Apr 27, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/69
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for generating plasma and a method for elemental analysis, each comprising the steps of providing a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; filling the flow channel and the narrow portion with a conductive liquid, and thereafter applying an electric field to the narrow portion, to conduct the electric field through the narrow portion, thereby generating plasma at the narrow portion. An apparatus for generating plasma, the apparatus for generating plasma comprising a narrow portion in a flow channel made of an insulation material, the narrow portion having a cross-sectional area markedly smaller than a cross-sectional area of the flow channel; and a means of applying an electric field to the narrow portion to conduct the electric field through the narrow portion; and an apparatus for emission spectroscopic analysis comprising the apparatus for generating plasma as defined above.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.