Patent · US Active

Semiconductor substrate of GaAs and semiconductor device

US7875961B2 · kind B2 · utility

1Cited by
12References
16Claims
0Family size

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Key dates

Filing dateNov 19, 2009
Grant dateJan 25, 2011
Priority date
Expiry dateNov 19, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/824
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor substrate, of GaAs with a semiconductor layer sequence applied on top of the substrate. The semiconductor layer sequence comprises a plurality of semiconductor layers of Al1-yGayAs1-xPx with 0≦x≦1 and 0≦y≦1. A number of the semiconductor layers respectively comprising a phosphorus component x which is greater than in a neighboring semiconductor layer lying thereunder in the direction of growth of the semiconductor layer sequence. Two semiconductor layers directly preceding the uppermost semiconductor layer of the semiconductor layer sequence have a smaller lattice constant than the uppermost layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.