Chemical liquid supply device
US7878375B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 9, 2007 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Feb 28, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical liquid supply device applies chemical liquid from a nozzle to a processed object. The nozzle is provided in a moving head, which reciprocates between an applying position and a waiting position and includes an application valve operating so as to take an applying state of applying the liquid from the nozzle and a stopped state of stopping the application. Chemical liquid is pumped from a tank through a filter to a valve chamber of the application valve via a supply tube. The valve chamber is connected to a buffer tank through a circulation tube. The circulation tube is provided with a circulation valve for opening/closing its flow path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.