Dual laser targeting system
US7878405B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 7, 2004 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | Feb 8, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06K7/10732
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A dual laser targeting system is described. At least one pair of lasers is arranged symmetrically about an objective lens in a symbology reader. The lasers project a beam along their respective axis, which, when an optical element is placed in front of the laser, produces multiple beams concentric about each laser axis. These multiple beams produce a composite pattern that appears to be symmetrical about the optical axis of the objective lens. The resulting targeting pattern includes laser beam spots that frame the field of view (FOV) of the symbology reader, and the laser beam spots on the laser axes frame the optical center of the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.