Method and apparatus for efficient application of substrate coating
US7879411B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 2002 |
| Grant date | Feb 1, 2011 |
| Priority date | — |
| Expiry date | May 29, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/548
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A direct vapor deposition (DVD) method and apparatus for applying coating(s) on substrate(s), including: presenting at least one of the substrates to a chamber, presenting at least one evaporant source (125) in crucible (110) to the chamber; presenting at least one carrier gas stream (105) to the chamber using a ring-shaped (133) converging/diverging nozzle (130); impinging at least one evaporant source with at least one electron beam in the chamber to generate an evaporated vapor flux in a main direction respective for any of the evaporant sources impinged by the electron beam; and guiding at least one of the generated evaporated vapor flux by at least one carrier gas stream from the ring shaped gap (132), which is essentially parallel to the main direction and substantially surrounds the evaporated flux. The evaporated vapor flux at least partially coats at least one of the substrates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.