Production of carbonyl fluoride

US7880039B2 · kind B2 · utility

Assignee

• SOLVAY FLUOR GMBH · DE

Inventors

• Max Braun · Großburgwedel, DE
• Johannes Eicher · Garbsen, DE

Key dates

• Filing date: Feb 9, 2005
• Grant date: Feb 1, 2011
• Expiry date: Jun 24, 2025

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B32/80
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

Carbonyl fluoride, which can also be used as an etching gas, can be prepared by photochemical oxidation of chlorodifluoromethane or trifluoromethane with light, for example with light of a wavelength ≧280 nm in the presence of chlorine.