Fabricating magnetic read heads with a reduced scratch exposure region
US7882618B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 2007 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Apr 19, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.