Patent · US Active

System for gas cleaning

US7883559B2 · kind B2 · utility

2Cited by

11References

18Claims

0Family size

Assignee

HYDAC PROCESS TECHNOLOGY GMBH · DE

Inventors

Knut Herges · Friedrichsthal, DE
Ralf Wnuk · Bexbach, DE

Key dates

Filing date	Sep 9, 2006
Grant date	Feb 8, 2011
Priority date	—
Expiry date	Mar 21, 2027

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S55/17
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A system for gas cleaning has at least one casing (1) with a first chamber (31) into which the gas to be cleaned can be flowed and with a second chamber (33) from which the cleaned gas exits. A filter device (35) can have the gas flow through it and can be arranged between the chambers. The filter device has filter media both for the separation of solid particles and for dehumidifying the gas by separating out coalesced liquid. The system has, upstream of the filter device (35), an arrangement (11, 37) for preliminary dehumidification of the gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.