Patent · US Active

System and method for nanotube growth via Ion implantation using a catalytic transmembrane

US7883580B2 · kind B2 · utility

5Cited by

0References

18Claims

0Family size

Assignee

Raytheon Company · US

Inventors

Delmar L. Barker · Tucson, US
Mead M. Jordan · Tucson, US
W. Howard Poisl · Tucson, US

Key dates

Filing date	Apr 2, 2008
Grant date	Feb 8, 2011
Priority date	—
Expiry date	Jul 2, 2029

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S977/844
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

Ion implantation is used to grow nanotubes out of carbon and other materials. Catalytic material is placed on or in a membrane that physically and possibly environmentally separates an implantation chamber or region from a growth chamber or region. High-energy ions are implanted into the catalytic material from one side to grow nanotubes on an exposed surface in the growth chamber. Ion implantation via the membrane provides for greater flexibility to separate and independently control the implantation and growth processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.