Cleaning liquid for lithography and cleaning method using same
US7884062B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2007 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Jul 31, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a cleaning liquid for lithography which is characterized by containing a mixed organic solvent which is obtained by mixing (A) at least one solvent selected from ketone organic solvents and glycol ether organic solvents, (B) at least one solvent selected from lactone organic solvents and (C) at least one solvent selected from alkoxy benzenes and aromatic alcohols. This cleaning liquid is highly safe and does not have adverse effects on the environment or the human body, while having basic characteristics necessary for a cleaning liquid for lithography. In addition, this cleaning liquid can be stably supplied at low cost.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.