Exposure apparatus and method of manufacturing device
US7884918B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 20, 2009 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | Sep 4, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a first measurement device, a second measurement device, and a controller. The first measurement device measures the position of a substrate stage in the optical axis direction when the substrate stage is scanned in the first direction. The second measurement device measures the surface positions of the substrate in the optical axis direction at a plurality of measurement points on one straight line extending in the second direction on the substrate. The controller controls the second measurement device to measure at least one identical region on the substrate at different measurement points of the plurality of measurement points both before and after the substrate stage moves in steps in the second direction, and calculates a measurement error of the first measurement device attributed to the driving of the substrate stage in the second direction based on the measurement result obtained by the second measurement device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.