Pattern transfer apparatus, imprint apparatus, and pattern transfer method
US7884935B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 18, 2007 |
| Grant date | Feb 8, 2011 |
| Priority date | — |
| Expiry date | May 28, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41M2205/26
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.