Apparatus and method for quantitatively measuring liquid film drying rates on substrates
US7886590B2 · kind B2 · utility
2Cited by
5References
11Claims
0Family size
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Key dates
| Filing date | Aug 8, 2003 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Aug 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/32
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus and method for measuring the drying rate of a liquid or liquid film in air or other gaseous media by either: a) measuring changes in the print density of the liquid; b) measuring changes in the dynamic surface tension of the liquid; c) measuring the differential pressure between an inert gas required to displace a sample of the liquid drawn into a capillary tube from a reservoir of the liquid and the pressure required for a bubble of the gas to form in the reservoir; and d) measuring the electrical conductance or resistance of the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.