Plasma processing apparatus
US7886687B2 · kind B2 · utility
11Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2005 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Apr 10, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32724
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus for generating plasma in a chamber maintained in a vacuum state and processing a substrate using the plasma. The plasma processing apparatus includes a refrigerant channel for circulating a refrigerant formed in a shower head, thereby easily controlling the temperature of the shower head and improving the reproducibility of plasma treatment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.