Method and apparatus for obtaining the distance from an optical measurement instrument to an object under test
US7887184B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2007 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | May 5, 2029 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/1005
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods for measuring a distance from a reference plane of an optical measurement instrument to a reference plane of an optical device under test are disclose. In one embodiment a system for measuring this distance includes an illumination system, an optical system, and optical sensor and a processor. The illumination system is configured or adapted to illuminate the object under test. The optical system is configured or adapted to receive light from the object under test and to produce an aberrated image. The optical sensor is configured or adapted to receive and sense the aberrated image. The processor determines the distance from the reference plane of the optical measurement instrument to the reference plane of the optical device based on an aspect of the aberrated image sensed by the optical sensor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.