Embossing process including discrete and linear embossing elements
US7887676B2 · kind B2 · utility
13Cited by
66References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 11, 2008 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | May 27, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24628
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An apparatus for producing a deep-nested embossed product including a first embossing member and a second embossing member. The first embossing member has a plurality of discrete embossing elements disposed in a first non-random pattern. The second embossing member has a plurality of second embossing elements including at least one linear embossing element. The second embossing elements are disposed in a second non-random pattern such the first non-random pattern and the second non-random pattern nest together to a depth of greater than about 0.01 mm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.