Patent · US Active

Site-selectively modified micro-and nanostructures and the methods of their fabrication

US7887723B2 · kind B2 · utility

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6Claims
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Assignee

Inventors

Key dates

Filing dateJan 17, 2007
Grant dateFeb 15, 2011
Priority date
Expiry dateNov 9, 2027

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y15/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.