Method of manufacturing plastic substrate using plasma process and plastic substrate manufactured using the method
US7887890B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Aug 21, 2006 |
| Grant date | Feb 15, 2011 |
| Priority date | — |
| Expiry date | Jan 30, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31938
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Provided is a method of manufacturing a plastic substrate with lower auto-fluorescence and better specificity. The method includes: (a) preparing a plastic substrate having an Atomic Force Microscopic (AFM) surface roughness of Ra<3 nm or Rq<4 nm under the condition of 50 μm×50 μm or less; (b) treating the plastic substrate with plasma; and (c) treating the plastic substrate with a surface-modifying monomer. A plastic substrate manufactured by the method is also provided. The plastic substrate exhibits a remarkably low auto-fluorescence and thus better specificity for detection of target biomolecules, which enables the broad application of a plastic substrate, which can be easily designed to include a microfluidic structure relative to a glass substrate but has been limitedly used due to high auto-fluorescence, to microarrays, biochips, or well plates. Furthermore, the method of manufacturing the plastic substrate enables an enhancement in the surface specificity of the plastic substrate and easy adjustment of the surface characteristics of the plastic substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.