Patent · US Active

Plasma lamp with conductive material positioned relative to RF feed

US7888874B2 · kind B2 · utility

2Cited by
56References
26Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 20, 2007
Grant dateFeb 15, 2011
Priority date
Expiry dateApr 25, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02B20/00
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

In an example embodiment, an electrodeless plasma lamp is provided which comprises a lamp body comprising a dielectric material having a relative permittivity greater than 2, and a bulb adjacent to the lamp body, the bulb containing a fill that forms a plasma when RF power is coupled to the fill from the lamp body. An RF feed is coupled to the lamp body and a radio frequency (RF) power source for coupling power into the lamp body through the RF feed is provided. A shortest distance between an end of the bulb and a point on the RF feed traverses at least one electrically conductive material of the lamp body.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.