Substrate with plane patterns and display device using the same
US7892626B2 · kind B2 · utility
1Cited by
16References
13Claims
0Family size
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Key dates
| Filing date | Sep 8, 2005 |
| Grant date | Feb 22, 2011 |
| Priority date | — |
| Expiry date | Jul 1, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate with plane patterns formed in a liquid process wherein the plane patterns are formed based on a combination of plane shapes by which a difference in internal pressure of a solution between any two points of the solution is small, the solution being ejected onto the substrate so as to form the plane patterns by the liquid process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.