Patent · US Active

Silicon/germanium oxide particle inks, inkjet printing and processes for doping semiconductor substrates

US7892872B2 · kind B2 · utility

3Cited by
23References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 2, 2008
Grant dateFeb 22, 2011
Priority date
Expiry dateMay 22, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24909
  • WIPO fieldBasic materials chemistry
  • WIPO sectorChemistry

Abstract

Highly uniform silica nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silican particles can be surface modified to form the dispersions. The silica nanoparticles can be doped to change the particle properties and/or to provide dopant for subsequent transfer to other materials. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to selectively dope semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.