Sputtering target and manufacturing method therefor, and recordable optical recording medium
US7897535B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Mar 1, 2007 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | Nov 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
To provide a sputtering target for preparing a recordable optical recording medium characterized by comprising Bi and B and a manufacturing method thereof, a recordable high density optical recording medium using the sputtering target, and a sputtering target which is capable of improving a speed of the film formation for the improvement of productivity, which has a high intensity at the time of the film formation and which has a heightened packing density.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.