Crystallization apparatus, crystallization method, device, and light modulation element
US7897946B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2008 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | May 29, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23K26/066
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A crystallization apparatus includes a light modulation element, and an image forming optical system that forms a light intensity distribution set based on light transmitted through the light modulation element on an irradiation surface. The crystallization apparatus irradiates a non-single crystal semiconductor film with light having the light intensity distribution to generate a crystallized semiconductor film. A curvature radius of at least one isointensity line of a light intensity substantially varies along the isointensity line in the light intensity distribution on the irradiation surface, and a curvature radius of at least a part of the isointensity line has a minimum value of 0.3 μm or below.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.