Distortion measurement imaging system
US7898670B2 · kind B2 · utility
2Cited by
10References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 26, 2008 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | Oct 23, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1309
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A distortion measurement and inspection system is presented. In one embodiment, a vision system is implemented. The vision system performs dual focal plane imaging where simultaneous imaging of two focal planes is simultaneously performed on a sample substrate and a reference substrate to determine distortion. In addition, a highly reflective background is implemented to provide for more resolution during distortion measurement.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.