Optical scan apparatus, image formation apparatus, optical deflector manufacturing method, polygon mirror processing method, and polygon mirror processing apparatus
US7898709B2 · kind B2 · utility
4Cited by
17References
20Claims
0Family size
Assignee
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Key dates
| Filing date | Jan 11, 2008 |
| Grant date | Mar 1, 2011 |
| Priority date | — |
| Expiry date | Mar 24, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T83/0524
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
In the optical deflector, the mean width of profile elements of a cross section of the deflection surface in the sub scan direction is set to be less than the spacing between spots of the light beams formed in the sub scan direction of the deflection surface. This makes it possible to prevent a variation in the size and shape of the spots of the light beams deflected by the deflection surface due to the undulation (unevenness) of the deflection surface. As a result, it is able to suppress a decrease of the granularity of images and form images with high quality.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.