Extended depth-of-field lenses and methods for their design, optimization and manufacturing

US7898746B2 · kind B2 · utility

Assignee

• Aptina Imaging Corporation · KY

Inventors

• Nicholas George · Pittsford, US
• Xi Chen · New York, US

Key dates

• Filing date: Jul 3, 2008
• Grant date: Mar 1, 2011
• Expiry date: Jan 5, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/0075
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

For rotationally symmetric aspheric lenses, one can establish lens design and layout based upon the phase delay function exp[−iφ(ρ)]. An embodiment of the invention is a method for calculating a corresponding variation in focal length denoted by f(ρ). According to an aspect, one can also assert a shape for the focal length f(ρ) and thereafter calculate a phase delay function in order to synthesize a novel lens. New EDoF lens designs are obtained by selection of an inner and outer focal length connected by a simple curve that can be approximate by a polynomial. From the selected f(ρ), one can synthesize a finished EDoF lens design and fabricate the lens. Another aspect of this invention is directed to a method to tailor prior-art EDoF lenses so that their performance over some range is improved.