Manufacturing method for vibrator
US7901587B2 · kind B2 · utility
0Cited by
1References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 16, 2005 |
| Grant date | Mar 8, 2011 |
| Priority date | — |
| Expiry date | Jul 17, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H2003/0492
- WIPO fieldBasic communication processes
- WIPO sectorElectrical engineering
Abstract
After an external shape of a photoresist layer is patterned with use of a Cr film as an underlayer, i.e., a metal film to serve as an anticorrosive film that resists crystal etching, and an Au film as a surface layer, the Au film is etched. After groove portions are then patterned, the Cr film is etched. Since no degenerated-surface layer cannot be formed on the photoresist layer with an etchant for the Au film, the groove portions can be patterned without any degenerated-surface layer according to this method, so that high-accuracy groove portions can be formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.