Controlling a projected pattern
US7903261B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2010 |
| Grant date | Mar 8, 2011 |
| Priority date | — |
| Expiry date | Feb 16, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/245
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Systems and methods to control projection of a pattern are provided. A particular method includes receiving first three-dimensional coordinates that specify one or more locations on a surface of a workpiece where the one or more locations correspond to a part definition to be projected onto the surface. The method also includes computing scan angles for a scanning system based on the first three-dimensional coordinates. The scan angles specify angles used by the scanning system to direct a beam of light to project the part definition onto the surface. The method also includes sending control signals to the scanning system based on the scan angles.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.