Computer-implemented method of optimizing refraction and TIR structures to enhance path lengths in PV devices
US7904871B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 19, 2009 |
| Grant date | Mar 8, 2011 |
| Priority date | — |
| Expiry date | Nov 6, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/52
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A computer-implemented method is provided for optimizing configuration of absorption enhancement structures for use in a photovoltaic enhancement film that is applied onto a PV device to improve absorption. The method includes receiving optimization run input defining a PV enhancement film including defining absorption enhancement structures with differing configurations. The method includes modeling a PV device including PV material such as a silicon thin film. A first ray tracing is performed over a range of incidence angles for the PV device. The method includes determining a set of base path angles for the PV material layer based on this first ray tracing. A second ray tracing is performed for the PV device with the enhancement film, which has absorption enhancement structures. Enhanced path lengths are determined based on the second ray tracking, and path length ratios are determined by comparing the enhanced path lengths to the base path lengths.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.