Low-irritation compositions and methods of making the same
US7906475B2 · kind B2 · utility
7Cited by
30References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2010 |
| Grant date | Mar 15, 2011 |
| Priority date | — |
| Expiry date | Apr 27, 2030 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61K2800/75
- WIPO fieldPharmaceuticals
- WIPO sectorChemistry
Abstract
Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.