Display device having thin film semiconductor device and manufacturing method of thin film semiconductor device
US7906834B2 · kind B2 · utility
0Cited by
2References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Jul 29, 2008 |
| Grant date | Mar 15, 2011 |
| Priority date | — |
| Expiry date | Feb 1, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/6728
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A display device having a thin film semiconductor device including a semiconductor thin film having first and second semiconductor regions formed each into a predetermined shape above an insulative substrate, a conductor fabricated into a predetermined shape to the semiconductor thin film and a dielectric film put between the semiconductor thin film and the conductor, in which the semiconductor thin film is a polycrystal thin film with the crystallization ratio thereof exceeding 90% and the difference of unevenness on the surface of the semiconductor thin film does not exceed 10 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.